http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001214055-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2000-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a6fe16c1d472e32bdd9487f030f03f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f6519ef28c89b650af5925645d953c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de632e1c03781dadcf4e81c1305813b1 |
| publicationDate | 2001-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001214055-A |
| titleOfInvention | Positive photosensitive polybenzoxazole precursor composition, pattern manufacturing method, and electronic component using the same |
| abstract | (57) [Summary] (with correction) [PROBLEMS] To provide a heat-resistant positive photosensitive resin composition having good sensitivity and resolution and a method for producing a pattern by using the above composition. (A) General formula (1) (Wherein, A is a tetravalent organic group, R 1 is a divalent organic group, and each R 2 is independently a hydrogen atom or a monovalent that can be decomposed by the action of an acid and converted to a hydrogen atom. An organic group, at least one of which is a monovalent organic group), wherein a film formed by the polybenzoxazole precursor has a film thickness of i per 20 μm. The line transmittance is 1% or more, and A polybenzoxazole precursor film formed on a silicon wafer by oxazole ring closure, the polybenzoxazole film having a residual stress of 25 MPa or less; and (B) irradiation with radiation to generate an acid. Positive photosensitive polybenzoxazole precursor composition comprising a compound represented by the formula: |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006282815-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6844744-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4500100-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005321467-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016124493-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9994538-B2 |
| priorityDate | 2000-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.