http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001203168-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-208 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2000-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4184e47bf022f09513f601f0db380bef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1969c1276e83fb808c9e1bed7b099d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cd10ee8c067e4fdaa0a70c320a20cde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed3375c508998272a5f0aafcbce62d77 |
| publicationDate | 2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001203168-A |
| titleOfInvention | Electron beam processing equipment |
| abstract | (57) [Summary] [PROBLEMS] To simultaneously and collectively irradiate a surface of a processing target to be processed with an electron beam simultaneously by effectively utilizing the energy of the electron beam. SOLUTION: A glass substrate 60 is arranged in a processing chamber 24, and a gas is introduced from a gas source 56 via a gas regulator 16 and a gas inlet 52, and an acceleration electrode 36 and an extraction electrode 3 are provided. 8, a voltage is applied from the accelerating voltage regulator 14 to accelerate and extract the electron beam generated by the electron beam source 10, and the electron beam 44 is introduced into the processing chamber 24 through the minute opening 48 of the partition wall 20. Forming an electron cloud 72 containing ionized plasma and irradiating the amorphous silicon thin film 74 on the glass substrate 60 with the electron beam 44, An annealing process is performed on the thin film 74. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103766003-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0217371-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6943128-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004056058-A |
| priorityDate | 2000-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.