abstract |
(57) [Abstract] (with correction) PROBLEM TO BE SOLVED: To obtain a film-forming composition which is excellent in long-term storage stability of a solution, and has low moisture absorption and a low dielectric constant coating film. (A) Compound R 1 a Si (OR 2 ) 4-a ... (1) represented by (1) (R 1 is H, F or a monovalent organic group, R 2 Is a monovalent organic group, a is an integer of 0 to 2) and a compound represented by formula (2): R 3 b (R 4 O) 3-b Si— (R 7 ) d —Si (OR 5 ) 3 -c R 6 c (2) (R 3 to R 6 are monovalent organic groups, b and c are 0 to 2, R 7 represents an oxygen atom or - (CH 2) n -, a group represented by, n represents a 1 to 6, d is 0 or 1. And (B) a compound represented by formula (3) HO— (SiR 8 R 9 O) e H (3) (where R 8 and R 9 are 1 ), A film-forming composition containing any of a hydrolyzate and a condensate with a valent organic group and e is an integer of 2 to 100. |