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filingDate 2000-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2d51952d4090354a0cea56848c08af3
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publicationDate 2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001200180-A
titleOfInvention Method for producing conductive powder
abstract (57) [Solution] After treating a powder with a silicon-based polymer compound having a reducing property to form a silicon-based polymer compound layer on the surface of the powder, the powder is treated in a state without aggregation. The powder is dispersed in water, and then the powder is treated with a metal salt composed of a metal having a standard oxidation-reduction potential of 0.54 V or more to deposit a colloid of the metal on the silicon-based polymer compound layer, and then electrolessly plated. A method for producing a metal-coated conductive powder, comprising treating the powder with a liquid to deposit a metal film on the outermost surface of the powder. According to the present invention, a metal-coated powder having a uniform plating layer on the entire surface can be obtained efficiently and efficiently, and the obtained metal-coated powder has high conductivity.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007023316-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013243404-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008032839-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03039793-A1
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type http://data.epo.org/linked-data/def/patent/Publication

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