| abstract |
PROBLEM TO BE SOLVED: To provide a positive photoresist composition which has high sensitivity, does not cause precipitation of insoluble matter during preparation of a resist solution or after storage over time, and has excellent dependency on density. . SOLUTION: A resin containing a specific silicon-containing repeating unit and having an increased solubility in an alkali developing solution by the action of an acid, an onium salt compound capable of generating an acid by irradiation with actinic rays or radiation, and a fluorine-based and / or silicon-based compound A positive photoresist composition containing at least one of a surfactant and a nonionic surfactant. |