| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1999-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d5ffbe3a002beae1e47db20f99af99f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 |
| publicationDate |
2001-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001183837-A |
| titleOfInvention |
Positive photoresist composition for deep ultraviolet exposure |
| abstract |
(57) [Problem] To provide a positive photoresist composition for deep ultraviolet exposure, which has improved line edge roughness and micro-grain, has excellent film forming uniformity, and has few particles in a resist solution. To do. SOLUTION: A compound that generates an acid upon irradiation with actinic rays or radiation, a resin containing a repeating unit corresponding to hydroxystyrene, and a resin whose solubility in an alkali developer increases by the action of an acid, propylene glycol monomethyl ether acetate and propylene Positive photoresist composition for deep ultraviolet exposure containing at least one solvent selected from the group of glycol monomethyl ether propionate and at least one solvent selected from the group of propylene glycol monomethyl ether and ethoxyethyl propionate . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2239631-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007101715-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100711540-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101036501-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006123487-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8394577-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007108253-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8753793-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007248727-A |
| priorityDate |
1999-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |