http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001176409-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08
filingDate 1999-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_facb9cde2b8e7828d22c245b7694544d
publicationDate 2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001176409-A
titleOfInvention Ion source
abstract (57) [Summary] [PROBLEMS] To extend the life of a filament while taking advantage of using trimethylindium gas or triethylindium gas as a source gas. This ion source utilizes a source gas containing indium by utilizing thermoelectrons generated from a filament. Is ionized in the plasma generation vessel 2 to extract an ion beam 16 containing indium ions. Moreover, the source gas 28 is a trimethylindium gas or a triethylindium gas. And the filament 8 Consists of tantalum.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011076736-A
priorityDate 1999-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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