Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_79b5f9d76648dfc226a261cfb970de9c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-4845 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-4865 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-4885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-192 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G15-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-1142 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-4324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-4322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-2272 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G15-16 |
filingDate |
2000-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ce50c82a75b283cbc6fef32d1ec1add http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01985129b328e8c9dafe549948ff980b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b746ac69241f7c7eaa3d437ca7e0ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10f032ff953fc1fb256aa73a5d0c51c0 |
publicationDate |
2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2001175087-A |
titleOfInvention |
Intermediate transfer belt with a seam capable of forming images |
abstract |
(57) [Problem] To provide an intermediate transfer belt having a seam capable of forming an image. An intermediate transfer belt (41) having a seam capable of forming an image is formed by joining both ends of the belt at a seam, and has a seam area near the seam and a far area distant from the seam. 1 includes a substrate 10 and an overcoat 42 on a seamed substrate having a toner retaining surface. The seam area has good electrical characteristics correspondence with the far area, The seam region and the far region have a lateral resistivity greater than 10 8 Ω / sq. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010500202-A |
priorityDate |
1999-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |