http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001172402-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7ef01e33058cf740cf2197991be97af1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D65-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C47-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L23-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 |
| filingDate | 1999-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48717c1cf2b0e7f0313ea21704680eb9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a734c9d4708fb803e06bd501fffe3e4 |
| publicationDate | 2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001172402-A |
| titleOfInvention | Retort film and resin composition for retort film |
| abstract | (57) [Problem] To provide a retort film having heat resistance, high transparency and good low-temperature impact resistance, and a polypropylene-based resin composition suitable for producing the film. SOLUTION: The haze at 23 ° C is 5% or less, and the impact strength at -10 ° C is 40 (kg · cm). / Mm) or more, and the difference in haze before and after the film is placed in an atmosphere of 50 ° C. and subjected to hot water treatment is 5% or less. A resin composition suitable for forming the film is polypropylene 65-95. (% By weight) and ethylene having Mw / Mn of 3.0 or less. Propylene / 1-butene copolymer of 5 to 35 (% by weight). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007046307-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5063357-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008018409-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8003223-B2 |
| priorityDate | 1999-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.