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filingDate 1999-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfce26401681fab4b07837b0fc643ff1
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publicationDate 2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001172168-A
titleOfInvention Skin cleaning method
abstract (57) Abstract: The following components (A), (B) and (C): (A) 0.1 to 7% by weight of an anionic surfactant (B) 20 to 65% by weight of polyols % (C) A skin washing method in which a composition containing 10 to 50% by weight of water is applied to the skin without lathering, and then washed with water. [Effect] According to this skin cleaning method, sufficient detergency can be obtained, a refreshing feeling can be obtained at the time of cleaning, and there is no flattering feeling, and moist and moisturized skin can be given after cleaning.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017088556-A
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