http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001166473-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L75-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-14 |
| filingDate | 1999-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15e8660f04f7d0deed9b7c273d93bd82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b792326c4f9de8ad0f01acfb1217943c |
| publicationDate | 2001-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001166473-A |
| titleOfInvention | Photosensitive heat-resistant resin precursor composition |
| abstract | (57) Abstract: A photosensitive heat-resistant resin precursor composition having good pattern processability and excellent storage stability can be obtained. A photosensitive heat-resistant resin comprising (a) a polymer having a structural unit represented by general formula (1) and (b) an amine compound represented by general formula (2) as main components. Precursor composition. Embedded image (R 1 represents a divalent organic group having at least 2 or more carbon atoms, and R 2 represents a tetravalent organic group having at least 2 or more carbon atoms. —COOR 3 group and —NHC The O- group is at the ortho position, and R 3 represents at least one selected from hydrogen, an alkali metal ion, an ammonium ion, and an organic group having 1 to 30 carbon atoms. 100 mol% consists of hydrogen. X represents at least one selected from a single bond and -NH-. ) (R 4 , R 5 , and R 6 are organic groups having 1 to 30 carbon atoms, at least one of which is an organic group containing a photosensitive group.) |
| priorityDate | 1999-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 175.