http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001154358-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 1999-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf3bbfae1495c9c84d4baa197b6480f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1512e632b2dd75442d3e4f65473c85eb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6596c77e5af8fd5d96e08303ba4645c |
| publicationDate | 2001-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001154358-A |
| titleOfInvention | Processing method of positive photosensitive resin composition and semiconductor device |
| abstract | PROBLEM TO BE SOLVED: To provide a method of processing a positive photosensitive resin composition capable of obtaining a high-sensitivity pattern with a high residual film ratio even in a thick film processing. SOLUTION: This is a two-layer organic film of a positive photosensitive resin composition having a different amount of film reduction in an unexposed part. The positive photosensitive resin composition is coated on a support, dried, and further coated thereon. After applying and drying a positive photosensitive resin composition having a smaller amount of film loss in an unexposed area than the positive photosensitive resin composition of the first layer, This is a method of forming a pattern by exposing and developing. |
| priorityDate | 1999-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.