abstract |
PROBLEM TO BE SOLVED: To provide a positive photo with sufficient sensitivity and resolving power in forming a contact hole pattern in the manufacture of a semiconductor device, less generation of particles in a resist solution, and excellent in coarse / dense dependency. To provide a resist composition. (A) A sulfonium salt compound which generates an acid represented by a specific structure, (B) a specific silicon-containing repeating unit, and at least one of repeating units having a specific structure. An acid-decomposable resin whose solubility in an alkaline developer is increased by the action of an acid, A positive photoresist composition comprising (C) a solvent, (D) an organic basic compound, and (E) a surfactant having a specific structure. |