http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001147532-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1999-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7078bf6026b8eb8f789155ae6b65fffd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8299e5d23e6728a39d8a6cf557471f68 |
| publicationDate | 2001-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001147532-A |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | (57) [Summary] [PROBLEMS] As a chemically amplified resist, it has excellent dry etching resistance, sensitivity, resolution, etc., and avoids line width fluctuation of the resist pattern due to fluctuation in the delay time between exposure and heat treatment after exposure. The present invention provides a radiation-sensitive resin composition which is capable of exhibiting excellent process stability. SOLUTION: The radiation-sensitive resin composition comprises (A) 8-methyl-8-hydroxytetracyclo [4.4.0.1]. 2,5 . 1 7,10 ] dodec-3-ene / itaconic anhydride / A resin containing an alkali-insoluble or hardly-soluble alkali-dissociable group, such as a t-butyl (meth) acrylate copolymer, which becomes alkali-soluble when the acid-dissociable group is dissociated; and B) It contains a radiation-sensitive acid generator. |
| priorityDate | 1999-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 625.