| abstract |
(57) [Problem] To provide a negative resist composition having an excellent pattern shape, a small dependence of a pattern dimension on a post-exposure bake temperature, and an excellent sensitivity and resolution. SOLUTION: An alkali-soluble resin, an acid generator, a crosslinking agent, and the following formula (I) Wherein A represents a divalent aliphatic hydrocarbon residue optionally interrupted by imino, a sulfide group or a disulfide group, X represents a nitrogen atom or C (NH 2 ), and R 1 and R 2 , Independently of one another, represents hydrogen or alkyl). |