http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001131742-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f23cc93743d34994a6e8bf8cfd011996 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
| filingDate | 1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9785eca867b767ae4c2d5b3bc30a6385 |
| publicationDate | 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001131742-A |
| titleOfInvention | Magnetron sputtering apparatus and magnetron sputtering method |
| abstract | (57) Abstract: In a magnet sputtering apparatus, a film can be formed on a substrate without being affected by a high plasma density and a life of a target (10) can be increased even if there is a position where a magnet (11) reciprocating linearly stops. Improve. A corner of a substrate is disposed at a position where a magnet reciprocating linearly stops and corresponding to a moving end having the highest plasma density, and a substrate body is inclined with respect to a moving direction of the magnet. And the substrate body is removed from the moving end. |
| priorityDate | 1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.