http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001130958-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00
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filingDate 1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27592472705abfcae72b068b228d6bf5
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publicationDate 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001130958-A
titleOfInvention Method of manufacturing piezoelectric thin film or ferroelectric thin film
abstract (57) [Problem] When a piezoelectric / ferroelectric thin film is manufactured using a post-annealing method represented by a sol-gel method, it is difficult to control the crystal orientation. In a drying step of a raw material solution, when a maximum temperature of substrate heating is T ° C. and a heating time at this temperature is t minutes, a condition represented by 350 ≦ T ≦ 450t-5t (0 <t) is satisfied. To heat the substrate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008120644-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015130491-A
priorityDate 1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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