http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001129474-A

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filingDate 1999-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc9787ecb99e8ac6d096e4b9a79b089f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ce202ace88f8c15f7feed170353aff0
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publicationDate 2001-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001129474-A
titleOfInvention Method for forming swelling pattern and substrate having the pattern
abstract (57) [Summary] (With correction) [Problem] To provide a completely new method of forming a concave-convex pattern that does not require an etching step or an embossing step using a mold. A pattern formed of a water-repellent portion and a hydrophilic portion has a contact angle difference of 80 degrees or more with respect to water to improve selectivity of a portion where a hydrophilic substance is deposited. Further, the difference between the hydrophilic portion and the contact angle of the base layer having the fine uneven structure and the uppermost layer having the water repellency is set to 80 degrees or more in the water repellent portion. In order to improve the resolution of the water-repellent / hydrophilic pattern, an intermediate layer having photodegradation activity is provided between the underlayer and the uppermost layer, and a water-repellent surface layer is selectively decomposed by irradiation with light through a photomask. Is possible. The use of a liquid containing colloidal silica and water as a hydrophilic fluid improves the selectivity of deposition and enables formation of a large bulge shape. In particular, a larger bulge pattern can be formed by using a liquid in which thermoplastic fine particles are dispersed.
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