http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001125268-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-167 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 1999-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_666cc6a59eb11d2aeb91b5aa32f7f2a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcdad3b4cdb00a34ba955cce05ecc6e8 |
| publicationDate | 2001-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001125268-A |
| titleOfInvention | Exposure method |
| abstract | (57) [Problem] To improve the light transmittance of a resist layer in a wavelength region of extreme ultraviolet EUV, and to enable ultrafine processing more than ever. When a resist layer is selectively exposed to X-rays and patterned into a predetermined shape, at least a part of hydrogen atoms of an existing resist material is substituted with an alkyl group as a polymer material constituting the resist layer. A polymer material substituted with a group, a substituent containing an aromatic ring, or both of them is used. By substituting a hydrogen atom of the polymer material with a substituent containing an alkyl group or a substituent containing an aromatic ring, as a result, the ratio of oxygen atoms to all the atoms constituting the polymer material is relatively reduced, Optical absorption of the entire polymer material is suppressed. |
| priorityDate | 1999-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.