http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001109167-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate | 1999-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_139bbe7636edf8b3a291c4fa5b809b5e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05a84d1287876dff7ed3ed11817f4b51 |
| publicationDate | 2001-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001109167-A |
| titleOfInvention | Stripper for photopolymerizable photosensitive material and method for forming rib pattern using the same |
| abstract | (57) Abstract: A stripping solution for a photopolymerizable photosensitive material that can dissolve and remove a photopolymerizable photosensitive material used in the production of a PDP satisfactorily and can form a highly accurate rib pattern, and using the stripping solution. To provide a method for forming a rib pattern. A stripping solution for a photopolymerizable photosensitive material, comprising (a) an organic amine, (b) a quaternary ammonium salt and (c) water, and formation of a rib pattern using the stripping solution. Method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030017247-A |
| priorityDate | 1999-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 124.