http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001109158-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1999-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2113184180e029b99bc7519cffd6446c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7078bf6026b8eb8f789155ae6b65fffd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8299e5d23e6728a39d8a6cf557471f68 |
publicationDate | 2001-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001109158-A |
titleOfInvention | Radiation-sensitive resin composition |
abstract | PROBLEM TO BE SOLVED: To provide a chemically amplified resist having high transparency to radiation, excellent basic properties as a resist such as dry etching resistance, sensitivity, resolution, pattern shape, etc., and developing defects during fine processing. Provided is a radiation-sensitive resin composition capable of producing a semiconductor device with a high yield without causing a problem. SOLUTION: The radiation-sensitive resin composition comprises (A) 8-hydroxymethyltetracyclo [4.4.0.1 2,5 . 1 7,10 ] dodeca-3-ene / maleic anhydride / t-butyl (meth) acrylate copolymer and the like. A resin which becomes alkali-soluble when the functional group is dissociated, and (B) a radiation-sensitive acid generator. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003026728-A |
priorityDate | 1999-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 589.