http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001106910-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3f548ca15b9b5748f1afd80e3d1636ec |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate | 1999-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_491adc967e5983493dbb4f8de4de2a85 |
| publicationDate | 2001-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001106910-A |
| titleOfInvention | Photosensitive resin composition and method for producing the same |
| abstract | PROBLEM TO BE SOLVED: To provide a polyimide precursor capable of forming a negative pattern which can be developed with an alkaline aqueous solution and a method for stably producing the polyimide precursor. SOLUTION: (A) R 3 and R 4 represented by the following formulas: Is a group having an aromatic ring having phenolic OH, R 5 Is a polyimide precursor that is a group having an ethylenically unsaturated bond, (B) a dehydrating condensing agent such as diphenyl (2,3-dihydro-2-thioxo-3-benzoxazole) phosphonate used in synthesizing the above (A) polyimide precursor, and (C) improving sensitivity to actinic rays. A photosensitive resin composition comprising a photosensitive agent and a solvent (D), and a method for producing the same. |
| priorityDate | 1999-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 303.