http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001102373-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 |
| filingDate | 2000-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21747acfb77b0d181ab4dff0d66658d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_632f6908d4b0f373196d987f61595bd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f128d9c2440afff71001e59f763b9ed |
| publicationDate | 2001-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001102373-A |
| titleOfInvention | Semiconductor device manufacturing equipment |
| abstract | (57) [Summary] [PROBLEMS] To prevent contamination and to shorten the process time. SOLUTION: A laser irradiation apparatus and a CVD film forming apparatus are connected to a common chamber provided with a robot arm, and further, a multi chamber is connected to a transfer chamber for loading a cassette for accommodating a plurality of substrates to be processed in the common chamber. A chamber type device is used. Substrates can be placed in a plurality of devices in a state where they are placed in a cassette in the transfer carry-in room, and processed substrates can be taken out of the device in a state where they are placed in the cassette. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8338216-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003096556-A |
| priorityDate | 2000-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.