http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001100420-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1999-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cb048b86304949d908d7c33ed66073c |
publicationDate | 2001-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001100420-A |
titleOfInvention | Positive photoresist composition |
abstract | (57) [Summary] [PROBLEMS] In a semiconductor device manufacturing, a high sensitivity of 0.2 When a photoresist having a high resolution of less than μm and a rectangular shape is provided, and used as the upper resist of a two-layer resist system, a positive shift with a small dimensional shift when transferring the pattern to the lower layer in the oxygen plasma etching step is obtained. A photoresist composition is obtained. The structural unit represented by the formula (I): Is -A-OCO-, -A-COO-, -A-NHCO-, -A-NHCOO-, -A-NHCONH -, -A-CONH-, -A-OCONH- or -AS-, wherein A is a single bond or an arylene group, X is a divalent linking group, Q is a hydrogen atom or an acid-decomposable group (however, A) wherein all Qs are not hydrogen atoms in the polysiloxane containing)), and n is an integer of 1 to 6. A positive photoresist composition containing an acid-decomposable polysiloxane containing}. Embedded image |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009286980-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002287339-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002055452-A |
priorityDate | 1999-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 298.