http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001085370-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_77387b1b9bc023eec7f13d42ecd85ea9 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 1999-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d50e73799a7d1192f436e104d9cd287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_132422c38fd443000966dde6d1aa01fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd839eefc3bbe50b91ccc0a660688086 |
publicationDate | 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001085370-A |
titleOfInvention | Chemical mechanical polishing composition for use in semiconductor processing |
abstract | (57) Abstract: A chemical mechanical polishing composition for semiconductor processing is provided, the composition comprising a water-soluble anionic chemical. The present invention provides a chemical mechanical composition as a slurry, wherein the slurry comprises 70 9999.5 wt% aqueous medium, 0.1-25 wt% abrasive, 0.01-2 wt% polishing accelerator, and 0.01 Contains 11% by weight of water-soluble anionic chemicals. The chemical mechanical polishing composition of the present invention may further contain an oxidizing agent in order to improve a polishing rate. Effect When a metal film is polished, a water-soluble anionic chemical substance is coated on the surface of the metal film, thereby preventing a depression from being formed on the metal circuit after polishing. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010188514-A |
priorityDate | 1999-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 88.