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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
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filingDate 1999-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84a019402ae47d1c9d6656fb2c3d2339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b39d4a4702ba3cad51b144bcac751b3b
publicationDate 2001-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001075278-A
titleOfInvention Resist solution, resist transfer film, and method for treating strip-shaped metal sheet using the same
abstract (57) [Problem] To provide a resist solution and a resist transfer film which are excellent in storability, in which there is little variation between products in a hole diameter of a through-hole formed in a strip-shaped metal sheet and unevenness in the product, and excellent storage stability. Provided is a method for treating a strip-shaped metal sheet. A resist solution applied to the surface of a shadow mask material W to form a resist film on the surface thereof includes a predetermined content of trehalose in addition to a water-soluble polymer and a photosensitive compound. Have been. In the coating step 10 including the resist liquid application processing 11, a resist film is formed on the surface of the shadow mask material W using such a resist liquid. Thereafter, the storage 91, the exposure step 20, the storage 92, and the development step 30 are sequentially performed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003029416-A
priorityDate 1999-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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