http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001056556-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1999-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
| publicationDate | 2001-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001056556-A |
| titleOfInvention | Positive photoresist composition for deep ultraviolet exposure |
| abstract | (57) [Problem] To solve the problem of the performance improvement technology inherent in microphotofabrication using far-ultraviolet light, particularly ArF excimer laser light. It is an object of the present invention to provide a positive photoresist composition for deep ultraviolet exposure, which is free from the problems of development defects and edge roughness. SOLUTION: A compound which generates an acid upon irradiation with actinic rays or radiation, a resin containing a repeating unit having a specific structure, a resin whose solubility in an alkali increases by the action of an acid, and a specific solvent with respect to all solvents 60-90 A positive photoresist composition for exposure to deep ultraviolet light, containing a solvent in a weight percentage. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005515267-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004057422-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8932794-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7771911-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100821283-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100757729-B1 |
| priorityDate | 1999-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 356.