Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a96a0c6720fd3ca29fe8740ecf1996be |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 |
filingDate |
2000-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61519dc9c55d58ec6eab6791a6237c45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_239f3bf7b070994dc035a8c85bf8056a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b5faa875e5e1a2ec9efc1d2e4714f80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d05876e85e1daf4c5ee0a7b94252db18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dab00d293b17c98bc7bd18cde99b964 |
publicationDate |
2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2001048962-A |
titleOfInvention |
Phenolic resin |
abstract |
(57) [Problem] To provide a phenol resin which gives a good pattern shape, heat resistance, resolution and sensitivity in a resist for lithography and the like. SOLUTION: Compound (A) (4-hydroxymethyl- A phenolic resin obtained by reacting at least two components of a polymerizable phenol compound (e.g., parahydroxystyrene) or a polymer (B) which is a polymer of the polymerizable phenol compound; The compound (A) and the polymerizable phenol compound are used in an amount of 1 to 50 mol per 100 mol of the polymerizable phenol compound or 100 mol of the structural unit of the polymerizable phenol compound contained in the polymer (B). A phenol resin having a weight-average molecular weight of 2,000 to 20,000 obtained by reacting at least two components of the acidic phenol compound or the polymer (B) in the presence of an acid. |
priorityDate |
1999-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |