http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001035779-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0a6a69da5879eb83f56f6876dba3e3cf |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 1999-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3992939cf3b0a41986e22bcf70ecf91 |
| publicationDate | 2001-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001035779-A |
| titleOfInvention | Method of forming fine pattern |
| abstract | (57) [Summary] [PROBLEMS] It is not necessary to directly immerse a resist after baking in a developing solution, and it is possible to detect a size shift due to a defocus of an exposure apparatus, and to uniformity of a size in a chip. And a method for forming a fine pattern which can easily secure the fine pattern. SOLUTION: The method for forming a fine pattern according to the present invention comprises, as a main component, a polymer compound or a monomolecular compound in which at least a part of a phenolic hydroxyl group is substituted by a protecting group which is easily removed by the action of an acid. A step of applying a chemically amplified resist made of a radiation-sensitive material on a semiconductor substrate and baking it; a step of exposing the chemically amplified resist to a basic atmosphere; and exposing the chemically amplified resist at a wavelength of far ultraviolet rays or less. And a step of developing with an aqueous alkali solution after heating if necessary. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005088398-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501229-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2005088398-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101163113-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1295750-C |
| priorityDate | 1999-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 60.