http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001035401-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7c5a4ae81822d214a07bf55ad61bd1cf |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08 |
| filingDate | 1999-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_facb9cde2b8e7828d22c245b7694544d |
| publicationDate | 2001-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001035401-A |
| titleOfInvention | Ion source |
| abstract | (57) [Summary] [PROBLEMS] To stabilize the operation of an ion source, stabilize the amount of ion beam generated, extend the life of components and simplify maintenance. SOLUTION: This ion source is provided with a gas introduction mechanism for introducing an inert gas 32 together with an organic metal gas 28 as a raw material gas into a plasma generation vessel 2. The gas introduction mechanism includes two gas introduction ports 6 provided on the wall surface of the plasma generation vessel 2, and is connected to each of the gas introduction ports 6. 8 and gas introduction pipes 26 and 30 for introducing the inert gas 32 into the plasma generation vessel 2, respectively. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2019412-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2019412-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1936653-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7589328-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9299529-B2 |
| priorityDate | 1999-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.