http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001031711-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-08 |
filingDate | 2000-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd2caead3ab024f25d1b794b8bd658d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d118243da3cb4d4cae2f8575d0e51239 |
publicationDate | 2001-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2001031711-A |
titleOfInvention | Method for producing styrene resin and method for producing styrene resin composition |
abstract | (57) [Problem] To provide a method for producing a high-quality styrene-based resin with high production efficiency. SOLUTION: The method for producing a high-purity styrene-based resin by removing monomers contained in a styrene-based resin produced by polymerization using a vertical stirring type thin film evaporator, comprising: The intrinsic viscosity [η] at 30 ° C. of an acetone-soluble methyl ethyl ketone solution of a styrene-based resin to be supplied to a thin film evaporator is 0.2 to 2.5. A method for producing a styrene-based resin, wherein the styrene-based resin is in a range of dl / g. |
priorityDate | 1999-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.