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filingDate 1999-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2001-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001024283-A
titleOfInvention Semiconductor laser manufacturing method and semiconductor laser
abstract (57) [Problem] To provide a strained quantum well semiconductor laser having improved reliability by increasing a critical film thickness. SOLUTION: In the step of crystal-growing a double hetero structure including a strained quantum well active layer 3 in which a well layer and a barrier layer are stacked on a GaAs substrate, the growth temperature of the well layer is set to a value of the crystal growth layer other than the well layer. It is characterized by being lower than the growth temperature.
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Total number of triples: 23.