http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001022050-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_663cad2cddb9415ae5ba8d9c99803cda |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56 |
| filingDate | 1999-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90eb268e0a620fa193ca1fdb77e088a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61e7fcc17372cf1f3f782f2e3846e81c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_972e1746a30971302ad1d7d323ea5aa7 |
| publicationDate | 2001-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001022050-A |
| titleOfInvention | Processing method of mask material for exposure |
| abstract | (57) [Problem] To provide a method of processing a mask material for exposure, which is capable of sharply reproducing even a fine image without being discolored or denatured by heat or ultraviolet rays. A physical development nucleus layer is provided between a glass substrate and a silver halide emulsion layer, and a metallic silver image having a thickness of 1 micron or less is formed on the glass substrate by physical development. A method for treating a silver halide photosensitive exposure mask material having a maximum optical density of 1.0 or more, wherein the treatment is performed in the presence of a protease. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009087615-A |
| priorityDate | 1999-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 117.