| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1999-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_757f8711d3b59c4a88a269e18468cfe7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9da8ff6776a95c7ef10b2b92fadd34a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc |
| publicationDate |
2001-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001005198-A |
| titleOfInvention |
Photo-resist stripping composition and photo-resist stripping method using the same |
| abstract |
PROBLEM TO BE SOLVED: To provide a photoresist excellent in exfoliation properties of a photoresist layer and a deposition (residue) generated after etching and ashing, and excellent in corrosion prevention of a substrate on which a metal film, an inorganic film, etc. are formed. And a photoresist stripping method using the same. SOLUTION: The color difference (ΔE * ab ) in the L * a * b * color system defined in JIS Z 8730 is 30 to 18. A photoresist stripping solution composition of 0 (reference value: pure water) and a photoresist stripping method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160033023-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160030835-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4677030-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008537182-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102392027-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102392062-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016148834-A |
| priorityDate |
1999-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |