http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001005146-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 |
| filingDate | 1999-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7e454f6f7001aa1ace8c2311f69683a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01758797b32818ecbfc63644d014cfa4 |
| publicationDate | 2001-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001005146-A |
| titleOfInvention | Thermal development recording material |
| abstract | (57) [Summary] [Problem] Thermal development that is excellent in photographic performance and high in quality such as good surface condition, and has excellent adhesion without peeling failure during processing and cutting even at high processing speed. Providing photosensitive materials. A heat-developable recording material having, on a support, at least one kind of organic acid silver layer containing at least one kind of organic acid silver and a reducing agent of the organic acid silver, and at least one protective layer. An undercoat layer having a thickness of 0.4 μm or more and 2 μm or less between the support and the organic acid silver layer, wherein the undercoat layer comprises a polymer having a glass transition temperature of less than 10 ° C. 10% to 100% by weight of the total weight of A heat-developable recording material comprising: |
| priorityDate | 1999-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 171.