| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is excellent in photocurability and resolution, enables high-aspect ratio and high-precision pattern processing, and a plasma display using the same to form a desired baked product pattern. Provide a panel (PDP). SOLUTION: The photosensitive paste composition contains (A) inorganic fine particles, (B) an organic component containing a photopolymerizable compound, and (C) a bisacylphosphine oxide-based photopolymerization initiator. By using such a photosensitive composition, P is formed by a lift-off method or a photolithography method. A desired fired product pattern such as a partition wall pattern, a dielectric pattern, and an electrode pattern of the DP can be formed with high productivity. |