| abstract |
(57) [Summary]nPROBLEM TO BE SOLVED: To be suitable as an interlayer insulating film in a semiconductor device or the like. It is possible to form a coating film with a uniform thickness. It is hard to cause racks, gives very low dielectric constant, and Providing film-forming composition with excellent balance of mechanical strength To do.nSOLUTION: (A) (R 1 ) a Si (OR Two ) 4-a (R 1 Is methyl, ethyl, vinyl, phenyl A monovalent organic group selected from the group Two Is monovalent organic A represents an integer of 0 to 2) And (B) (R Three ) b Si (OR Four ) 4-b (R Three Represents a linear alkyl group having 4 or more carbon atoms, a branched alkyl group, An aliphatic cyclic alkyl group; Four Represents a monovalent organic group And b is an integer of 1 to 2). Hydrolysis and / or hydrolysis in the presence of a catalyst and water in an organic solvent Or film-forming composition containing condensed hydrolyzed condensate object. |