http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000321744-A

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filingDate 1999-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5973a729a4da957244f31e33cd6c9a45
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publicationDate 2000-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000321744-A
titleOfInvention Thermal development device
abstract (57) [Object] To provide a thermal developing apparatus capable of performing low-cost and easy thermal stable development and stable gradation reproduction. A maximum heating value of a heater (32) is set to Hmax. Assuming that the heat capacity of the film F is M, 0.07 ≦ M / Hm a, the duty ratio does not become too small, the tone ratio can be controlled easily and stably, and the film F is heated by the relationship M / Hmax ≦ 0.75. Even if the amount of heat deprived of the film 32 fluctuates with time, the heater has a sufficient margin, the temperature of the film F is stabilized, the heat is sufficiently developed, and stable gradation reproduction can be performed.
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priorityDate 1999-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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