http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000315455-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 |
filingDate | 1999-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_142f92c8fcb0f6ffb317b93785946098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a34c8247d6bab00beaea9634ba75d98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89cdc9619d7212792c3e3f99214878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10e12d3eb26de2468ba9261fc3200536 |
publicationDate | 2000-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2000315455-A |
titleOfInvention | Manufacturing method of phosphor pattern |
abstract | Abstract: PROBLEM TO BE SOLVED: To provide a phosphor pattern capable of forming a phosphor pattern with a good yield with a sufficient margin over the entire wall surface of a concave portion surrounded by a barrier rib wall surface and a substrate bottom surface of a substrate having irregularities such as a PDP substrate. I will provide a. (Ia) A step of forming a layer of a photosensitive paste containing a phosphor on an uneven surface of a substrate having unevenness, and (Ib) a step of forming a layer of a photosensitive paste containing a phosphor. (C) forming a resin layer containing fine particles on the layer, (II) forming a resin layer containing fine particles (C) and a layer of photosensitive paste containing fluorescent material (A) based on the opening width of the concave portion. Irradiating actinic rays imagewise through a photomask having a narrow actinic ray transmission width, (III) (C) removing the resin layer containing fine particles, and selectively removing unnecessary portions of the (A) phosphor-containing photosensitive paste layer by development to form a pattern; and (IV) A method for producing a phosphor pattern, comprising the steps of removing unnecessary components from the pattern by firing. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002170495-A |
priorityDate | 1999-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 347.