| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate |
2000-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13b22d9eeb786cbc988697b112737eaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfb72b2b3ef5c5b9d09c4563f7c2883d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8ee06394f702079ccb496e35f964a03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20c55d330817ba085801eb1ff3eb3cde |
| publicationDate |
2000-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000292915-A |
| titleOfInvention |
Radiation-sensitive composition |
| abstract |
(57) [Summary] In a resist for manufacturing a semiconductor integrated circuit, An excellent resist composition is obtained by eliminating mixing of insoluble fine particles and bubbles. SOLUTION: In the radiation-sensitive composition containing a film-forming resin, a photoacid generator and a solvent, the radiation-sensitive composition further contains an alcohol in an amount of 2% by weight or less based on the film-forming resin. |
| priorityDate |
1999-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |