| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 |
| filingDate |
1999-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df911bd0014519ad7401a0b598868616 |
| publicationDate |
2000-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000292908-A |
| titleOfInvention |
Pellicle for lithography |
| abstract |
(57) [Problem] To provide a pellicle for lithography comprising a pellicle film having high light transmittance and excellent durability even when irradiated with a short-wavelength vacuum ultraviolet light for a long time. SOLUTION: At least a pellicle for lithography having a pellicle film attached to a pellicle frame has a thickness of 160 n. A pellicle for lithography, comprising a pellicle film having a light transmittance of 50% or more when irradiated with an excimer laser of m or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7604904-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009151335-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009271262-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7351503-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011095586-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6946199-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009116284-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013228582-A |
| priorityDate |
1999-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |