http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000251677-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J31-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-316 |
| filingDate | 1999-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7d6f7870d448f67f839eb4fc4ae6ebe |
| publicationDate | 2000-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000251677-A |
| titleOfInvention | Method of manufacturing electron source and image forming apparatus |
| abstract | [PROBLEMS] To uniformly activate each electron-emitting device of an electron source comprising an electron-emitting device subjected to a plurality of activation steps, Obtain excellent electron emission characteristics. The activation process divided into a plurality of steps has a pause time during which no activation process is performed between the activation process steps for the same electron-emitting device, and is performed after the pause time. The waveform condition of the activation pulse voltage in the initial stage of the activation process in the next step is different from the waveform condition of the activation pulse voltage in the final stage of the activation process in the previous step. |
| priorityDate | 1999-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.