http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000243920-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_86df70be6baafcc380c5c26c307c005b
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B17-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822
filingDate 1999-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc581106744a761991673dde6e7a88d6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_febae78ded06cf46c6ba44ed60d36548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_486410e4beda5dfe988319d59486a90a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7a69075b211991659472d836fbba52e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cecf6e9b34649cdfb6852e652fb0a916
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2b78ab23ce76768cd306682949b27a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95974f9ecd87803e087b297d46536229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05fade924b1600d0f681d8a67ed4d38d
publicationDate 2000-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000243920-A
titleOfInvention Manufacturing method of ferroelectric memory
abstract (57) [Problem] A ferroelectric memory composed of a PZT thin film with a high orientation on a (111) plane can be formed by low-temperature firing, thereby avoiding damage to transistors and the like formed on another same substrate. To provide a method for manufacturing a ferroelectric memory. SOLUTION: Pb x (Zr (1-y) Ti y ) O 3 [where x Is applied to a substrate, and the sol-gel liquid is dried and then heat-treated at a temperature of 250 to 350 ° C. (First heat treatment step). The step of applying the sol-gel liquid and the first heat treatment step are repeated a plurality of times. Thereafter, the thin film is heat-treated at a temperature of 500 to 600 ° C. (second heat treatment step).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011029270-A
priorityDate 1999-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583149
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90139
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450791316
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16685708
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454013724
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16686084
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578251
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID73212

Total number of triples: 38.