http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000243684-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
filingDate 1999-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b428a65d7f75ca6b80659964356fc0df
publicationDate 2000-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000243684-A
titleOfInvention Exposure apparatus and device manufacturing method
abstract (57) [Summary] [PROBLEMS] To eliminate or reduce thermal deformation of an original plate. SOLUTION: In an exposure apparatus for illuminating a pattern on an original plate 3 and exposing the object to be exposed directly or via a projection optical system, blowing means 2, 4 and 5 for blowing a gas or a gas whose temperature is controlled to the original plate. , 7 and control means for controlling any one or more of the blowing amount, the blowing position, and the blowing direction of the gas or the temperature-controlled gas. Or A member that holds the original plate by sending a fluid or a temperature-controlled fluid to the surface of the member that holds the original plate, a unit that has a mechanism that holds the original plate, or a piping section provided around the original plate, and a mechanism that holds the original plate And cooling means for cooling the periphery of the unit or the original plate having the above. Alternatively, a refrigerant circulation circuit that circulates around the original plate and uses a low-boiling-point refrigerant as a working medium is provided, and a decompression mechanism is connected to the refrigerant circulation circuit.
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Total number of triples: 43.