| abstract |
(57) [Summary] (Modifications) [Problem] Particularly, it is hard to be affected by the pattern shape due to other film layers, particularly, an acidic upper antireflection film, and the height of a pattern which is an unexposed portion and a rectangular shape of a pattern head. Provided is a radiation-sensitive composition capable of maintaining the properties. SOLUTION: A film forming resin (A) and a photoacid generator (B) And a radiation-sensitive composition containing an organic base (C), wherein the film-forming resin (A) exhibits a different decomposition rate in the presence of an acid, and becomes alkali-soluble. A radiation-sensitive composition, which is a mixture of a resin (A1) composed of the following (III) and a resin (A2) composed of the following structural units (II) and (III). |