Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad2cd796f8c4dcb425ddcc68707d3444 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M13-152 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M13-335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D01F6-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06P1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D01F1-10 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M101-16 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M13-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M13-152 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D01F6-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06P1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M11-83 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D01F1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M13-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M13-335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06M13-332 |
filingDate |
1999-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01b7568af035483f2c6c31a32916fd13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3118b583096268cc5d67e5e9a04f7688 |
publicationDate |
2000-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2000234265-A |
titleOfInvention |
Polybenzazole molded article excellent in light resistance and method for producing the same |
abstract |
(57) [Summary] [Problem] To provide a polybenzazole molded article excellent in light resistance and suitable for industrial materials and firefighting suits, and a method for producing the same. A polybenzazole molded article excellent in light resistance obtained by applying a light-resistant agent having a regular reflectance of 30% or less in a region of 30% or more in a wavelength range of 450 nm to 700 nm, and Extruding the polybenzazole solution, A method for producing a polybenzazole molded article having excellent light resistance, in which a light-resistant agent is imparted to the molded article after extracting the solvent and before drying. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005344232-A |
priorityDate |
1999-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |