http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000228143-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate | 1999-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_810fb334b8c40c1f63b66be48fbac307 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_682988a045ba07986fe4937592e49633 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ab3cac5a836ff577cab0918256dbee0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a543886b693cb73be9f402836efb57c4 |
| publicationDate | 2000-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000228143-A |
| titleOfInvention | Pattern manufacturing method and transfer film |
| abstract | PROBLEM TO BE SOLVED: To provide a method of manufacturing a PDP and a method of manufacturing a pattern suitably used for manufacturing an electrode constituting a LCD, an organic EL element, a printed circuit board, a multilayer circuit board, a multi-chip module, an LSI, etc. Provided is a transfer film suitably used in a production method. SOLUTION: A second inorganic powder-containing resin layer containing a radiation-sensitive component is formed on a first inorganic powder-containing resin layer containing no radiation-sensitive component, and the second inorganic powder is formed. Exposure and development of the resin layer containing the first inorganic powder corresponding to the pattern of the second resin layer containing the inorganic powder by etching the first resin layer containing the inorganic powder by exposing and developing the pattern Forming a pattern of the resin layer, a method for producing a pattern, comprising a step of baking the pattern, Provided is a transfer film used in the method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007157689-A |
| priorityDate | 1999-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 86.