| abstract |
(57) [Problem] To provide excellent peelability to both a photoresist film and a deteriorated film, and to form a metal film, especially a substrate on which Al or an Al alloy is formed, even under high-temperature processing conditions, or Provided is a photoresist stripper composition capable of effectively preventing corrosion of both substrates on which Ti is formed, and a photoresist stripping method using the same. SOLUTION: (a) 2 to 30% by weight of hydroxylamines, (b) 2 to 35% by weight of water, (c) 25 to 40% by weight of monoethanolamine and / or 2- (2-aminoethoxy) ethanol, (D) 20 to 32% by weight of N-methyl-2-pyrrolidone and / or diethylene glycol monobutyl ether, and (e) 2 to 20% by weight of an aromatic hydroxy compound, a photoresist stripping composition, and a photoresist using the same Peeling method. |