http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000196064-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-762 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-148 |
| filingDate | 1998-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dabe812b52eae921d850fcd9f25f827 |
| publicationDate | 2000-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000196064-A |
| titleOfInvention | Method for manufacturing solid-state imaging device |
| abstract | (57) [Summary] (With correction) [PROBLEMS] To provide a method of manufacturing a solid-state imaging device capable of removing an etching residue. SOLUTION: A step of forming an interlayer insulating film 15 covering the transfer electrodes 13 and 14, and a step of forming a tungsten polycide film or a tungsten polycide film covering the step 30 formed by the transfer electrodes 13 and 14 and the interlayer insulating film 15 thereon. A step of forming a wiring layer 16 made of a polycrystalline silicon film, a step of forming a first resist pattern thereon, and performing anisotropic etching using this as a mask to form a wiring layer other than near the step portion 30 A first etching step of etching and removing the first resist pattern, a step of removing the first resist pattern, and a second resist pattern 19 covering the remaining wiring layer 16 serving as a wiring portion. And etching is performed under the condition that side etching is performed using this as a mask to remove the wiring layer 16 remaining as a residue in the vicinity of the step portion 30 by etching. And a method of removing the second resist pattern 19. |
| priorityDate | 1998-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.