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filingDate 1998-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa27e8db22f2701a4f2462f6439cc0d5
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publicationDate 2000-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000192085-A
titleOfInvention Cleaning composition for dry cleaning
abstract PROBLEM TO BE SOLVED: To provide a dialkyl sulfosuccinic acid-based surfactant and a non-alkyl phenol ethoxylate excellent in cleaning performance and hydration ability without using an alkyl phenol ethoxylate in a cleaning composition for dry cleaning. In preparing a dry cleaning composition in combination with a nonionic surfactant of the type, a dry cleaning composition having excellent solution stability at low temperatures is provided. SOLUTION: A cleaning composition for dry cleaning mainly comprising (A) a dialkyl sulfosuccinate or a salt thereof, and (B) a non-alkylphenol ethoxylate type nonionic surfactant, wherein (C) A cleaning composition for dry cleaning, comprising an alkyl or alkenyl benzene sulfonate having at least one alkyl or alkenyl group having 1 to 5 carbon atoms.
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priorityDate 1998-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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